The MSV-300 series is a microspectroscopy system providing transmittance/reflectance measurements of microscopic sample sites for a wide range of wavelengths from ultraviolet to near infrared. Conventional measurements require samples with dimensions comparable to a mm sized optical beam. The MSV-300 series can measure color, film thickness, and other spectral properties of a microscopic area for either large or small samples. The optional automated X-Y-Z stage provides multi-point measurements and surface analysis mapping capabilities.

System Features

• Wide spectral measurement range
  Continuous measurements between 250 and 2,000 nm (MSV-370) using a spectrometer with a wide band, Cassegrain objective.
   
• Simple operation
  The integrated CCD camera allows verification of the analysis site and sample position while defining the sample aperture on the software system.
   
• Double-beam system
  Superior measurement stability using a double-beam spectrophotometer.
   
• Automated X-Y-Z stage
  With the optional automated stage, discrete measurement areas can be selected using the mouse while simultaneously viewing the sample area on the CCD monitor.

Microscope image monitor 70 x 240 µm aperture set for a blue filter on an LCD panel	RGB filter on an LCD panel

Microscope image monitor Measurement of SiO2 on Si wafer (Sampling area : 30 × 30 µm)	SiO2 layer thicknes measurement Film thickness was calculated as 1.98 µm

Si Wafer

Specifications