UHPLC

JASCO is pleased to introduce the UHPLC™ series of exterme high pressure liquid chromatography instrumentation. This series of components is designed to operate at pressures approaching 15,000 psi for either gradient or isocratic separations.

JASCO's UHPLC provides researchers with a powerful tool to take advantage of newly available small particle size packed columns providing efficiency and speed that was previously not possible in a commercial HPLC. All of this while retaining the ability to run traditional HPLC methods.

LC-2000Plus Series System

A versatile series of components offering unique flexibility to build isoratic and high/low pressure gradient systems for routine and specialized applications.

• Compact design
• Modular components offering PC system or direct keypad control
• Micro, analytical and preparative solvent delivery systems
• Wide range of detectors
• 50, 100 and 120 position autosamplers
• Solvent switching, mixing and degassing
• Column switching and temperature control
• 32 bit software package for control and full data analysis

LC-2000Plus Series Components

The JASCO Corporation was founded in 1948 to produce optical spectroscopy products for University research departments.
The experience gained by JASCO in both optical design and computer technology led to the production of spectrophotometric detectors for HPLC.
The move into the HPLC market continued with the production of solvent delivery systems, gradient elution devices and a complete range of detectors, JASCO has more than 30 years experience in the design and development of innovative chromatography instrumentation for a wide range of applications.
A worldwide network of companies supports the full range of analytical instrumentation in educational, industrial, quality control and research laboratories.
The latest development is the LC-2000Plus series High Performance Liquid Chromatograph which meets the key requirements of today's analytical laboratory.

SFE/SFC
The complexity of integrated circuits has been increasing as lithography technology improves. In order to achieve pattern width in the sub-micrometer range, the method of photoresist stripping and cleaning of silicom wafers is critical.
Supercritical CO2 offers excellent performance as a cleaning solvent in the photoresist stripping/cleaning/drying processes due to unique properties such as low viscosity, high diffusivity, high permeability, no surface tension, among other reasons.

The JASCO ChromPass Chromatography Data System (ChromPass) is a state-of-the-art, chromatography software platform that provides JASCO HPLC system control, data acquisition, processing, interpretation, and reporting with features to support laboratories under compliance with 21 CFR Part 11.